OEM Group 470S SRD High Performance Spin Rinse Dryer Wafer Cleaner. The SRD is a 25 wafer, batch size, single or dual chamber tool. This proven design has demonstrated uptime of 95%. Introduced in 1979, over 25,000 SRD units have shipped worldwide. Spray on axis orientation allows uniform spray onto the wafers. Clean / Rinse built-in resistivity monitoring assures an automatic and reliable clean; the process chamber is cleaned with the product; quick ramp S model brushless DC motor provides economy and efficiency. Dry centrifugal drying, coupled with heated nitrogen and a lowpressure nitrogen purge through a heated process chamber. Flexible Fast easy to change rotors for simple re-configuration to match any array of applications’ wafers. Currently configured with single bolt rotor for 6" x 6" squares. 120V, 50/60Hz, 15A